Mr. Thijs Hollink
at
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Publications (6)

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Logic, Optical lithography, Etching, Metals, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Tin, Back end of line

PROCEEDINGS ARTICLE | September 4, 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Reticles, Deep ultraviolet, Reflection, Scanners, Coating, Reflectivity, Extreme ultraviolet, Aluminum, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Deep ultraviolet, Scanners, 3D modeling, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Algorithm development, Optimization (mathematics), Fiber optic illuminators

PROCEEDINGS ARTICLE | April 16, 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Imaging systems, Electroluminescence, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | April 2, 2011
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Lithography, Diffraction, Seaborgium, Polarization, Scattering, Wavefronts, 3D modeling, Photomasks, Semiconducting wafers, 3D image processing

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Reticles, 3D acquisition, Scanners, Wavefronts, Photomasks, Source mask optimization, Computational lithography, Optimization (mathematics), Semiconducting wafers, 3D image processing

Showing 5 of 6 publications
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