Dr. Werner Gillijns
Researcher Optical Lithography at imec
SPIE Involvement:
Publications (51)

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12954, 129540L (2024) https://doi.org/10.1117/12.3010127
KEYWORDS: SRAF, Printing, Semiconducting wafers, Optical proximity correction, Photoresist processing, Extreme ultraviolet lithography, Calibration, Extreme ultraviolet

Proceedings Article | 10 April 2024 Presentation + Paper
Soobin Hwang, Werner Gillijns, Stefan de Gendt, Ryoung-han Kim
Proceedings Volume 12954, 129540X (2024) https://doi.org/10.1117/12.3010869
KEYWORDS: SRAF, Photomasks, Source mask optimization, Optical lithography, Logic, Extreme ultraviolet lithography

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12953, 129530K (2024) https://doi.org/10.1117/12.3010519
KEYWORDS: Optical proximity correction, Semiconducting wafers, Extreme ultraviolet lithography, Modeling, Scanners, Reticles

Proceedings Article | 12 December 2023 Poster + Paper
Nitesh Pandey, Stefan Hunsche, Adam Lyons, Christoph Hennerkes, Andreas Verch, Maximilian Albert, Grizelda Kersteen, Renzo Capelli, Werner Gillijns, Balakumar Baskaran, Joost Bekaert
Proceedings Volume PC12751, PC127510Z (2023) https://doi.org/10.1117/12.2688109
KEYWORDS: Calibration, Metrology, Scanning electron microscopy, Data modeling, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Computational lithography, Design, Optical proximity correction

Proceedings Article | 22 November 2023 Presentation
Proceedings Volume PC12751, PC127510Q (2023) https://doi.org/10.1117/12.2687822
KEYWORDS: Optical proximity correction, Photomasks, Extreme ultraviolet, Calibration, Semiconducting wafers, Scanning electron microscopy, Printing, Modeling, Machine learning, Data modeling

Showing 5 of 51 publications
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