Koen van Ingen Schenau
at ASML Netherlands BV
SPIE Involvement:
Publications (33)

Proceedings Article | 13 March 2018 Paper
Fuming Wang , Stefan Hunsche, Roy Anunciado, Antonio Corradi , Hung Yu Tien, Peng Tang, Junwei Wei, Yongjun Wang, Wei Fang, Patrick Wong, Anton van Oosten, Koen van Ingen Schenau, Bram Slachter
Proceedings Volume 10585, 1058525 (2018) https://doi.org/10.1117/12.2297603
KEYWORDS: Semiconducting wafers, Stochastic processes, Scanning electron microscopy, Metrology, Electron beam lithography, Photomasks, Inspection, Critical dimension metrology, Optical proximity correction, Deep ultraviolet

Proceedings Article | 20 October 2016 Paper
Proceedings Volume 10032, 100320B (2016) https://doi.org/10.1117/12.2250630
KEYWORDS: Photomasks, Extreme ultraviolet, Lithography, Extreme ultraviolet lithography, Nanoimprint lithography, Semiconducting wafers, Reticles, Reflectivity, Scanners, Image quality

Proceedings Article | 18 March 2016 Paper
Proceedings Volume 9776, 97761I (2016) https://doi.org/10.1117/12.2220150
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Reticles, Scanners, Semiconducting wafers, Source mask optimization, Wafer-level optics, Lithography, Imaging systems, Extreme ultraviolet, Neodymium, Ions

Proceedings Article | 16 November 2015 Paper
Proceedings Volume 9635, 963503 (2015) https://doi.org/10.1117/12.2202258
KEYWORDS: Extreme ultraviolet lithography, Scanners, Photomasks, Reticles, Image resolution, Lithography, Wafer-level optics, Semiconducting wafers, Source mask optimization, EUV optics, Imaging systems, Nanoimprint lithography, Ions, Neodymium

Proceedings Article | 4 September 2015 Paper
Proceedings Volume 9661, 96610S (2015) https://doi.org/10.1117/12.2195476
KEYWORDS: Photomasks, Imaging systems, Extreme ultraviolet, Nanoimprint lithography, Reticles, Semiconducting wafers, Electroluminescence, Ions, Nickel, Logic

Showing 5 of 33 publications
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