Mr. Jongwook Kye
VP at Samsung Electronics Co., Ltd.
SPIE Involvement:
Conference Chair | Conference Co-Chair | Conference Program Committee | Editor | Author | Instructor
Publications (48)

SPIE Conference Volume | April 24, 2017

PROCEEDINGS ARTICLE | March 30, 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Logic, Optical lithography, Visualization, Etching, Metals, Error analysis, Manufacturing, Monte Carlo methods, Solids, Photomasks, Directed self assembly, Optical proximity correction, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Wafer-level optics, Lithography, Metrology, Inspection, Optical metrology, Process control, Finite element methods, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Optics manufacturing, Defect inspection

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Logic, Switching, Metals, Reliability, Resistance, Power supplies, Capacitance, Design for manufacturing, Transistors, Integrated circuit design, Electronic design automation, Inductance

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Reflectors, Statistical analysis, Data modeling, Silicon, Reflectivity, Surface roughness, Monte Carlo methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Molybdenum, Electromagnetic theory, Scanning tunneling microscopy

SPIE Journal Paper | September 29, 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Directed self assembly, Lens design, Optical lithography, Immersion lithography, Photomasks, Neck, Lithography, Critical dimension metrology, Visualization, Optical proximity correction

Showing 5 of 48 publications
Conference Committee Involvement (7)
Optical Microlithography XXIX
23 February 2016 | San Jose, California, United States
Optical Microlithography XXVIII
24 February 2015 | San Jose, California, United States
Optical Microlithography XXVII
25 February 2014 | San Jose, California, United States
Optical Microlithography XXVI
26 February 2013 | San Jose, California, United States
Optical Microlithography XXV
14 February 2012 | San Jose, California, United States
Showing 5 of 7 published special sections
Course Instructor
SC779: Polarization for Lithographers
The advent of ultra high numerical aperture (NA) systems enabled by immersion lithography has quickly brought polarization toward the top of the lithographer's list of concerns. A high index liquid between the resist and the last lens element allows better resolution by enabling larger angles of incidence, and thus more diffraction energy to couple into the resist. However various polarizing effects can become severe with these large angles of incidence. Most notably contrast from the TM component drops to near or below zero. Thus, the engineering of polarization states is becoming a necessary resolution enhancement technique. Consequently, understanding and controlling polarization throughout all components of the optical system become critical. This course provides the lithographer a basic knowledge of polarization and its application to high-NA imaging. After an introduction to the concept of polarization and the various ways it can be represented, both the benefits and limitations of its application to lithography are discussed. The polarizing effects of each component of the optical system are addressed, offering an understanding of their ultimate impact on imaging.
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