Dr. Robert Watso
Design Engineer at ASML US Inc
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 22, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Reticles, Logic, Optical lithography, Metals, Photomasks, Double patterning technology, Critical dimension metrology, Semiconducting wafers, Tolerancing

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Reticles, Data modeling, Diffusion, Diagnostics, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Nanoimprint lithography, Photoresist processing

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Reticles, Particles, Silicon, Inspection, Scanning electron microscopy, Wafer inspection, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | March 27, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Molecular bridges, Imaging systems, Scanners, Particles, Manufacturing, Printing, Bridges, Double patterning technology, Immersion lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 20, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Polymers, Scanners, Coating, Digital watermarking, Platinum, Bridges, Photoresist processing, Semiconducting wafers, Standards development, Defect inspection

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Monochromatic aberrations, Reticles, Spatial frequencies, Sensors, Scanners, Control systems, Organic materials, Modulation transfer functions, Semiconducting wafers

Showing 5 of 6 publications
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