Dr. Nickolay Stepanenko
at Besi
SPIE Involvement:
Publications (16)

Proceedings Article | 11 May 2009 Paper
Proceedings Volume 7379, 73790R (2009) https://doi.org/10.1117/12.824268
KEYWORDS: Reticles, Photomasks, Semiconducting wafers, Printing, Wafer inspection, Inspection, Extreme ultraviolet, Scanning electron microscopy, Atomic force microscopy, Distortion

Proceedings Article | 1 April 2008 Paper
M. Maenhoudt, R. Gronheid, N. Stepanenko, T. Matsuda, D. Vangoidsenhoven
Proceedings Volume 6924, 69240P (2008) https://doi.org/10.1117/12.771884
KEYWORDS: Etching, Double patterning technology, Optical lithography, Logic, Photoresist processing, Coating, Thin film coatings, Semiconducting wafers, Scanners, Oxides

Proceedings Article | 11 May 2007 Paper
Rik Jonckheere, Gian Francesco Lorusso, Anne Marie Goethals, Jan Hermans, Bart Baudemprez, Alan Myers, Insung Kim, Ardavan Niroomand, Fumio Iwamoto, Nickolay Stepanenko, Kurt Ronse
Proceedings Volume 6607, 66070H (2007) https://doi.org/10.1117/12.729259
KEYWORDS: Reticles, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Silicon, Multilayers, Carbon, Contamination, Point spread functions

Proceedings Article | 4 April 2007 Paper
Proceedings Volume 6519, 65190E (2007) https://doi.org/10.1117/12.713150
KEYWORDS: Digital watermarking, Thin film coatings, Water, Semiconducting wafers, Crystals, Quartz, Silicon, Immersion lithography, Inspection, Polymers

Proceedings Article | 13 March 2007 Paper
Anne Marie Goethals, Rik Jonckheere, Gian Francesco Lorusso, Jan Hermans, Frieda Van Roey, Alan Myers, Manish Chandhok, Insung Kim, Ardavan Niroomand, Fumio Iwamoto, Nikolay Stepanenko, Roel Gronheid, Bart Baudemprez, Kurt Ronse
Proceedings Volume 6517, 651709 (2007) https://doi.org/10.1117/12.710798
KEYWORDS: Extreme ultraviolet, Reticles, Extreme ultraviolet lithography, Photomasks, Line edge roughness, Point spread functions, Scanners, Lithography, Printing, Critical dimension metrology

Showing 5 of 16 publications
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