Dr. Thomas Marschner
at Carl Zeiss SMT GmbH
SPIE Involvement:
Publications (23)

Proceedings Article | 5 October 2023 Paper
Yannick Hermans, Tilmann Heil, Renzo Capelli, Bartholomaeus Szafranek, Daniel Rhinow, Gerson Mette, Patrick Salg, Christian Felix Hermanns, Bappaditya Dey, Luc Halipre, Darko Trivkovic, Paulina Rincon Delgadillo, Thomas Marschner, Sandip Halder
Proceedings Volume 12802, 128020H (2023) https://doi.org/10.1117/12.2678392
KEYWORDS: Extrusion, Extreme ultraviolet, Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Extreme ultraviolet lithography, Lithography, Defect inspection

Proceedings Article | 3 October 2008 Paper
Peter Weidner, Alexander Kasic, Thomas Hingst, Carsten Ehlers, Sylke Philipp, Thomas Marschner, Manfred Moert
Proceedings Volume 7155, 71550Y (2008) https://doi.org/10.1117/12.814534
KEYWORDS: Semiconducting wafers, Scatterometry, Model-based design, Dimensional metrology, Atomic force microscopy, Infrared radiation, Metrology, Critical dimension metrology, Thermal modeling, High volume manufacturing

Proceedings Article | 20 March 2008 Paper
Kang-Hoon Choi, Rok Dittrich, Matthias Goldbach, Christoph Hohle, Katja Keil, Thomas Marschner, Mark Tesauro, Frank Thrum, Roy Zimmermann, Johannes Kretz
Proceedings Volume 6921, 69210J (2008) https://doi.org/10.1117/12.772649
KEYWORDS: Line edge roughness, Line width roughness, Electron beam direct write lithography, Amplifiers, Metrology, Cadmium, Electron beams, Lithography, Critical dimension metrology, Modulation

Proceedings Article | 30 October 2007 Paper
Proceedings Volume 6730, 67303B (2007) https://doi.org/10.1117/12.740407
KEYWORDS: Calibration, Photomasks, Critical dimension metrology, Standards development, Scanning electron microscopy, Semiconducting wafers, Scanners, Etching, Scatterometry, Roads

Proceedings Article | 14 May 2007 Paper
Proceedings Volume 6607, 660729 (2007) https://doi.org/10.1117/12.728992
KEYWORDS: Critical dimension metrology, Photomasks, Scanning electron microscopy, Metrology, Standards development, Semiconducting wafers, Calibration, Electron beams, Molecules

Showing 5 of 23 publications
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