Dr. Peter Z. Takacs
Retired at Brookhaven National Lab
SPIE Involvement:
Education Committee | Fellow status | Conference Program Committee | Conference Chair | Author | Editor
Area of Expertise:
optical metrology , surface profilometry , MTF of CCDs
Profile Summary

Peter Z. Takacs directs the activities of the Optical Metrology Laboratory in the Instrumentation Division of Brookhaven National Laboratory. He is actively involved in the development of instrumentation, methods, and standards used for testing the figure and finish of aspheric optics, such as those used for reflecting x-rays at grazing incidence, and in characterizing the performance of CCD sensors He received a BA from Rutgers University in 1969 and a PhD in physics from Johns Hopkins University in 1975.
Publications (84)

PROCEEDINGS ARTICLE | September 7, 2017
Proc. SPIE. 10385, Advances in Metrology for X-Ray and EUV Optics VII

PROCEEDINGS ARTICLE | September 7, 2017
Proc. SPIE. 10385, Advances in Metrology for X-Ray and EUV Optics VII
KEYWORDS: Diffraction, Prisms, X-ray optics, Metrology, X-ray sources, Interferometry, Optical metrology, Synchrotrons, Free electron lasers, Coherent x-ray sources

PROCEEDINGS ARTICLE | July 27, 2016
Proc. SPIE. 9915, High Energy, Optical, and Infrared Detectors for Astronomy VII
KEYWORDS: Sensors, Calibration, X-rays, Quantum efficiency, Electro optical sensors, Charge-coupled devices, Manganese, Monochromators, Large Synoptic Survey Telescope, Electro-optic testing

PROCEEDINGS ARTICLE | September 1, 2015
Proc. SPIE. 9576, Applied Advanced Optical Metrology Solutions
KEYWORDS: Optical microscopes, Spatial frequencies, Sensors, Calibration, Error analysis, Silicon, Optical fabrication, Modulation transfer functions, Binary data, Standards development

PROCEEDINGS ARTICLE | August 27, 2014
Proc. SPIE. 9173, Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VIII
KEYWORDS: Statistical analysis, Spatial frequencies, Interferometers, Light scattering, Surface roughness, Computing systems, Wavefronts, Signal processing, Optics manufacturing, Standards development

PROCEEDINGS ARTICLE | August 12, 2014
Proc. SPIE. 9154, High Energy, Optical, and Infrared Detectors for Astronomy VI
KEYWORDS: Point spread functions, Clocks, Sensors, Silicon, Distortion, Image sensors, Charge-coupled devices, CCD image sensors, Large Synoptic Survey Telescope, Prototyping

Showing 5 of 84 publications
Conference Committee Involvement (22)
Advances in Metrology for X-Ray and EUV Optics VII
6 August 2017 | San Diego, California, United States
EUV and X-ray Optics: Synergy between Laboratory and Space
26 April 2017 | Prague, Czech Republic
Advances in Metrology for X-Ray and EUV Optics VI
29 August 2016 | San Diego, California, United States
EUV and X-ray Optics: Synergy between Laboratory and Space
13 April 2015 | Prague, Czech Republic
Advances in Metrology for X-Ray and EUV Optics V
18 August 2014 | San Diego, California, United States
Showing 5 of 22 published special sections
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