Dr. Wolf-Dieter Domke
at Qimonda Dresden GmbH & Co OHG
SPIE Involvement:
Publications (10)

Proceedings Article | 2 April 2007 Paper
Yayi Wei, Markus Bender, Wolf-Dieter Domke, Antje Laessig, Michael Sebald, Sven Trogisch, David Back
Proceedings Volume 6519, 65190R (2007) https://doi.org/10.1117/12.706887
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing, Lithography, Image processing, Chemically amplified resists, EUV optics, 193nm lithography, Image resolution

Proceedings Article | 6 May 2005 Paper
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599343
KEYWORDS: Photomasks, Extreme ultraviolet, Semiconducting wafers, Multilayers, Printing, Scanning electron microscopy, Cadmium, Extreme ultraviolet lithography, Binary data, Imaging systems

Proceedings Article | 4 May 2005 Paper
Wolf-Dieter Domke, Karl Kragler, Marion Kern, Klaus Lowack, Oliver Kirch, Michele Bertolo
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599543
KEYWORDS: Extreme ultraviolet, Polymers, Extreme ultraviolet lithography, Spectroscopy, Synchrotrons, Ions, Chromatography, Diffusion, Molecules, 193nm lithography

Proceedings Article | 6 December 2004 Paper
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569289
KEYWORDS: Photomasks, Multilayers, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Reflectors, Cadmium, Critical dimension metrology, Photoresist materials, Scanning electron microscopy

Proceedings Article | 1 July 2002 Paper
Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472316
KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Photoresist materials, Scanning electron microscopy, Extreme ultraviolet, Photoresist processing, Semiconducting wafers, Deep ultraviolet, Semiconductors, Photoresist developing

Showing 5 of 10 publications
Conference Committee Involvement (3)
Advances in Resist Technology and Processing XXII
28 February 2005 | San Jose, California, United States
Advances in Resist Technology and Processing XXI
23 February 2004 | Santa Clara, California, United States
Advances in Resist Technology and Processing XX
24 February 2003 | Santa Clara, California, United States
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