Donna J. O'Connell
Optical Engineer at Sandia National Labs California
SPIE Involvement:
Publications (17)

Proceedings Article | 6 December 2004 Paper
Proceedings Volume 5567, (2004)
KEYWORDS: Inspection, Photomasks, Defect inspection, Scanning electron microscopy, Extreme ultraviolet lithography, Extreme ultraviolet, Printing, Defect detection, Reflectivity, Multilayers

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004)
KEYWORDS: Extreme ultraviolet lithography, Semiconducting wafers, Optical proximity correction, Lithography, Photomasks, Critical dimension metrology, Data modeling, Monte Carlo methods, Scanners, Scanning electron microscopy

Proceedings Article | 16 June 2003 Paper
Stewart Robertson, Patrick Naulleau, Donna O'Connell, Kevin McDonald, Todd Delano, Kenneth Goldberg, Steven Hansen, Kirk Brown, Robert Brainard
Proceedings Volume 5037, (2003)
KEYWORDS: Photomasks, Photoresist materials, Extreme ultraviolet lithography, Lithography, Calibration, Data modeling, Diffusion, Modeling, Extreme ultraviolet, Wafer-level optics

Proceedings Article | 16 June 2003 Paper
Charlotte Cutler, Joseph Mackevich, Jieming Li, Donna O'Connell, Gregory Cardinale, Robert Brainard
Proceedings Volume 5037, (2003)
KEYWORDS: Line edge roughness, Polymers, Surface roughness, Extreme ultraviolet, Atomic force microscopy, Deep ultraviolet, Molecular aggregates, Extreme ultraviolet lithography, Scanning electron microscopy, Semiconducting wafers

Proceedings Article | 16 June 2003 Paper
Patrick Naulleau, Kenneth Goldberg, Erik Anderson, Jeffrey Bokor, Bruce Harteneck, Keith Jackson, Deirdre Olynick, Farhad Salmassi, Sherry Baker, Paul Mirkarimi, Eberhard Spiller, Christopher Walton, Donna O'Connell, Pei-Yang Yan, Guojing Zhang
Proceedings Volume 5037, (2003)
KEYWORDS: Lithography, Extreme ultraviolet, Printing, Photomasks, EUV optics, Wafer-level optics, Semiconducting wafers, Extreme ultraviolet lithography, Mirrors, Fiber optic illuminators

Showing 5 of 17 publications
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