Dr. Wim P. de Boeij
Program System Engineer at ASML Netherlands BV
SPIE Involvement:
Publications (26)

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12953, 129530S (2024) https://doi.org/10.1117/12.3009961
KEYWORDS: Scanners, Distortion, Deep ultraviolet

Proceedings Article | 28 April 2023 Presentation + Paper
Bart Smeets, Paul Aben, Friso Klinkhamer, Jean Philippe van Damme, Bart Paarhuis, Raaja Ganapathy Subramanian, Mohamed El Kodadi, Stefan Lichiardopol, Alberto Pirati, Peter Vanoppen, Wim de Boeij
Proceedings Volume 12494, 124940R (2023) https://doi.org/10.1117/12.2657952
KEYWORDS: Reticles, Distortion, Semiconducting wafers, Overlay metrology, Optical alignment, Scanners, HVAC controls, Sensors, Reproducibility, Deep ultraviolet

Proceedings Article | 26 May 2022 Presentation + Paper
Proceedings Volume 12051, 120510K (2022) https://doi.org/10.1117/12.2614031
KEYWORDS: Distortion, Scanners, Overlay metrology, Metrology, Lithography, Interfaces, Spatial frequencies, Semiconducting wafers, Extreme ultraviolet lithography

Proceedings Article | 22 February 2021 Presentation
Bart Paarhuis, Wim de Boeij, Aditya Deshpande, Axel von Sydow, Hoite Tolsma, Martijn Houben, Geert Hofmans
Proceedings Volume 11613, 116130L (2021) https://doi.org/10.1117/12.2584494

Proceedings Article | 23 March 2020 Presentation + Paper
Thilo Pollak, Wolfgang Emer, Bernd Thüring, Francis Fahrni, Friso Klinkhamer, Wim de Boeij, Wim Bouman
Proceedings Volume 11327, 113270T (2020) https://doi.org/10.1117/12.2552063
KEYWORDS: Distortion, Spatial frequencies, Semiconducting wafers, Overlay metrology, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Immersion lithography, Lithography

Showing 5 of 26 publications
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