Farhad H. Salmassi
Lab Director at Lawrence Berkeley National Lab
SPIE Involvement:
Author
Publications (23)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Optical components, Electron beam lithography, Optical design, Reflection, Silicon, Atomic layer deposition, Extreme ultraviolet, Molybdenum, Structural engineering, Phase shifts

PROCEEDINGS ARTICLE | September 15, 2016
Proc. SPIE. 9963, Advances in X-Ray/EUV Optics and Components XI
KEYWORDS: Diffraction, Etching, X-rays, X-ray diffraction, Wet etching, Plasma etching, Extreme ultraviolet lithography, Monochromators, Direct write lithography, Diffraction gratings

SPIE Journal Paper | July 12, 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Photomasks, Extreme ultraviolet, Microscopes, Extreme ultraviolet lithography, Semiconducting wafers, Scanners, Modulation, Multilayers, Fiber optic illuminators, Nickel

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Microscopes, Multilayers, Optical lithography, Etching, Chromium, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Phase shifts

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Microscopes, Multilayers, Modulation, Lenses, Scanners, Nickel, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

PROCEEDINGS ARTICLE | September 5, 2014
Proc. SPIE. 9207, Advances in X-Ray/EUV Optics and Components IX
KEYWORDS: Fabrication, Diffraction, X-ray diffraction, Silicon, Coating, Wavefronts, Plasma etching, Monochromators, Direct write lithography, Diffraction gratings

Showing 5 of 23 publications
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