Farhad H. Salmassi
Lab Director at Lawrence Berkeley National Lab
SPIE Involvement:
Publications (31)

Proceedings Article | 4 October 2023 Presentation
Proceedings Volume PC12694, PC1269407 (2023) https://doi.org/10.1117/12.2678573
KEYWORDS: Blazed gratings, Diffraction gratings, Optical gratings, Plasma etching, Etching, Silicon, Polymers, Plasma, X-rays, X-ray diffraction

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 1249409 (2023) https://doi.org/10.1117/12.2660664
KEYWORDS: Refractive index, Transmittance, Chromium, Extreme ultraviolet, Thin films, Reflectivity, Contamination, Film thickness, Multilayers

Proceedings Article | 31 October 2022 Poster
Proceedings Volume PC12292, PC122920Y (2022) https://doi.org/10.1117/12.2645263
KEYWORDS: Extreme ultraviolet, Ruthenium, Phase shifts, Photomasks, Stochastic processes, Resolution enhancement technologies, Extreme ultraviolet lithography, Double patterning technology, Reticles, Optical lithography

Proceedings Article | 4 October 2022 Presentation + Paper
Proceedings Volume 12240, 1224008 (2022) https://doi.org/10.1117/12.2633512
KEYWORDS: Plasma etching, Etching, Diffraction gratings, Silicon, Plasma, Quartz, Diffraction, Photoresist processing, Atomic force microscopy, X-rays

Proceedings Article | 13 June 2022 Presentation
Chami Perera, Gi Sung Yoon, Ryan Carlson, Baorui Yang, Mike Hermes, Dave Houser, Alexander Khodarev, Chuck Murray, Travis Grodt, Arnaud Allézy, Weilun Chao, Farhad Salmassi, Eric Gullikson, Patrick Naulleau
Proceedings Volume PC12051, PC120510E (2022) https://doi.org/10.1117/12.2617277
KEYWORDS: Extreme ultraviolet, Photomasks, Reticles, Microscopes, Imaging systems, Zone plates, Semiconductors, Semiconducting wafers, Patents, Metrology

Showing 5 of 31 publications
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top