Dr. Paul Hinnen
System Engineer at ASML Netherlands BV
SPIE Involvement:
Publications (25)

Proceedings Article | 26 May 2022 Presentation + Paper
D. Slotboom, P. Hinnen, J. Mulkens
Proceedings Volume 12051, 120510L (2022) https://doi.org/10.1117/12.2614537
KEYWORDS: Scanners, Overlay metrology, Semiconducting wafers, Distortion, Deep ultraviolet, Extreme ultraviolet, Reticles, Optical parametric oscillators

Proceedings Article | 13 March 2018 Presentation + Paper
Proceedings Volume 10585, 105851L (2018) https://doi.org/10.1117/12.2297283
KEYWORDS: Metrology, Overlay metrology, Scanners, Semiconducting wafers, Extreme ultraviolet lithography, Logic, Optical proximity correction, Lithography, Critical dimension metrology, Electron beams

Proceedings Article | 13 March 2018 Presentation + Paper
Dong-Kiu Park, Hyun-Sok Kim, Moo-Young Seo, Jae-Wuk Ju, Young-Sik Kim, Mir Shahrjerdy, Arno van Leest, Aileen Soco, Giacomo Miceli, Jennifer Massier, Elliott McNamara, Paul Hinnen, Paul Böcker, Nang-Lyeom Oh, Sang-Hoon Jung, Yvon Chai, Jun-Hyung Lee
Proceedings Volume 10585, 105850V (2018) https://doi.org/10.1117/12.2297094
KEYWORDS: Overlay metrology, Metrology, Semiconducting wafers, Control systems, Manufacturing, Etching, Lithography, Critical dimension metrology, Inspection

Proceedings Article | 22 March 2016 Paper
T. Hasan, Y.-S. Kang, Y.-J. Kim, S.-J. Park, S.-Y. Jang, K.-Y. Hu, E. J. Koop, P. C. Hinnen, M. M. A. Voncken
Proceedings Volume 9778, 97783G (2016) https://doi.org/10.1117/12.2219121
KEYWORDS: Semiconducting wafers, Scanners, Servomechanisms, Sensors, Optimization (mathematics), Lithography, Yield improvement, Model-based design, Control systems, Process control

Proceedings Article | 19 March 2015 Paper
Hugo Cramer, Stefan Petra, Bastiaan Onne Fagginger Auer, Henk-Jan Smilde, Baukje Wisse, Steven Welch, Stefan Kruijswijk, Paul Hinnen, Bart Segers, Christian Leewis, Frank Staals, Maryana Escalante Marun, Stuart Young, Wei Guo, Arie den Boef
Proceedings Volume 9424, 94241F (2015) https://doi.org/10.1117/12.2085957
KEYWORDS: Semiconducting wafers, Metrology, Etching, Critical dimension metrology, Scanners, Scatterometry, Optical lithography, Optical metrology, Computer simulations, Overlay metrology

Showing 5 of 25 publications
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