Dr. Chris H. Clifford
Software Development Manager at Siemens EDA
SPIE Involvement:
Editorial Board Member: Journal of Micro/Nanopatterning, Materials, and Metrology | Editorial Board Member: Journal of Micro/Nanolithography, MEMS, and MOEMS | Author
Area of Expertise:
Computational Lithography
Profile Summary

I am working as a developer in the Calibre division at Siemens ( formerly Mentor Graphics ) in Fremont, CA.
Publications (31)

Proceedings Article | 20 March 2019 Presentation + Paper
Proceedings Volume 10962, 109620B (2019) https://doi.org/10.1117/12.2516101
KEYWORDS: Failure analysis, Critical dimension metrology, Lithography, Logic, Manufacturing, Photomasks, Error analysis, Stochastic processes, Visualization, Optical proximity correction

Proceedings Article | 19 March 2018 Presentation + Paper
Proceedings Volume 10583, 105830P (2018) https://doi.org/10.1117/12.2299668
KEYWORDS: Optical proximity correction, Photomasks, SRAF, Extreme ultraviolet, Image quality, Extreme ultraviolet lithography, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 16 October 2017 Paper
Proceedings Volume 10451, 104510W (2017) https://doi.org/10.1117/12.2280609
KEYWORDS: Optical proximity correction, Wavefronts, Extreme ultraviolet, Scanners, Photomasks, Error analysis, Extreme ultraviolet lithography, Manufacturing, 3D modeling, Tolerancing

Proceedings Article | 16 October 2017 Paper
Proceedings Volume 10450, 104500V (2017) https://doi.org/10.1117/12.2280548
KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Finite-difference time-domain method, Wafer-level optics, Systems modeling, Extreme ultraviolet lithography, Projection systems, Scanners, Electromagnetism

Proceedings Article | 28 September 2017 Paper
Proceedings Volume 10446, 104460V (2017) https://doi.org/10.1117/12.2281886

Showing 5 of 31 publications
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