Dr. Chris Clifford
Senior Software Development Engineer at Mentor Graphics Corp
SPIE Involvement:
Author
Area of Expertise:
EUV Lithography , Electromagnetic Simulation , Optical Proximity Correction
Websites:
Profile Summary

I am working as a developer in the Calibre division at Mentor Graphics in Fremont, CA.
Publications (30)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Image quality, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, SRAF, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Scanners, Error analysis, Manufacturing, Wavefronts, 3D modeling, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Tolerancing

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Wafer-level optics, Finite-difference time-domain method, Scanners, Projection systems, Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers, Electromagnetism, Systems modeling

PROCEEDINGS ARTICLE | September 28, 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference

SPIE Journal Paper | August 19, 2017
JM3 Vol. 16 Issue 04
KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Wafer-level optics, Finite-difference time-domain method, Extreme ultraviolet, Systems modeling, Scanners, Extreme ultraviolet lithography, Projection systems

SPIE Journal Paper | July 25, 2017
JM3 Vol. 16 Issue 03

Showing 5 of 30 publications
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