Dr. Jangho Shin
Senior field apps engineer at ASML
SPIE Involvement:
Senior status | Author
Area of Expertise:
Semiconductor Processing , Optical Lithography , Alignment , Overlay Metrology , Computational lithography , Defect inspection metrology
Profile Summary

Jangho (Jerry) Shin is presently a senior field apps engineer at ASML Korea. He was a researcher/manager at Samsung semiconductor R&D and is a Senior member of SPIE. Dr. Shin received his PhD in electrical and computer engineering from the University of Wisconsin at Madison in 2003.
Publications (18)

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Inspection, Semiconducting wafers, Photomasks, Metrology, Scanning electron microscopy, Critical dimension metrology, Electron beam lithography, Metals, Defect detection, Scanners

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Critical dimension metrology, Scanners, Lithographic illumination, Image processing, Process control, Computational lithography, Semiconducting wafers, Data modeling, Metrology, Photomasks, Calibration, Finite element methods, Laser scanners, 3D scanning

SPIE Journal Paper | July 1, 2010
JM3 Vol. 9 Issue 03

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Overlay metrology, Semiconducting wafers, Semiconductors, Optical lithography, Data modeling, Optical alignment, Scanners, Lithography, Metrology, Inspection

SPIE Journal Paper | July 1, 2009
JM3 Vol. 8 Issue 03
KEYWORDS: Semiconducting wafers, Overlay metrology, Scanners, Semiconductors, Optical alignment, Optical lithography, Metrology, Process control, Source mask optimization, Electronics

PROCEEDINGS ARTICLE | March 23, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Overlay metrology, Semiconducting wafers, Scanners, Semiconductors, Reticles, Optical lithography, Source mask optimization, Optical alignment, Metrology, Process control

Showing 5 of 18 publications
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