Dr. Jangho Shin
Manager, Senior Field Apps Engineer
SPIE Involvement:
Area of Expertise:
Semiconductor Processing , Optical Lithography , Alignment , Overlay Metrology , Computational lithography , Defect inspection metrology
Profile Summary

Jangho (Jerry) Shin is presently a senior manager of field apps engineering at ASML Korea. He was a researcher/manager at Samsung semiconductor R&D and is a Senior member of SPIE. Dr. Shin received his PhD in electrical and computer engineering from the University of Wisconsin at Madison in 2003.
Publications (19)

Proceedings Article | 22 February 2021 Poster + Paper
Proceedings Volume 11613, 116130Y (2021) https://doi.org/10.1117/12.2584692
KEYWORDS: Calibration, Machine learning, Signal processing, Physics, Optical proximity correction, Metrology, Lithography, Computational lithography

Proceedings Article | 28 March 2017 Presentation + Paper
Boo-Hyun Ham, Il-Hwan Kim, Sung-Sik Park, Sun-Young Yeo, Sang-Jin Kim, Dong-Woon Park, Joon-Soo Park, Chang-Hoon Ryu, Bo-Kyeong Son, Kyung-Bae Hwang, Jae-Min Shin, Jangho Shin, Ki-Yeop Park, Sean Park, Lei Liu, Ming-Chun Tien, Angelique Nachtwein, Marinus Jochemsen, Philip Yan, Vincent Hu, Christopher Jones
Proceedings Volume 10145, 101451P (2017) https://doi.org/10.1117/12.2257964
KEYWORDS: Inspection, Semiconducting wafers, Photomasks, Metrology, Scanning electron microscopy, Critical dimension metrology, Electron beam lithography, Metals, Defect detection, Scanners

Proceedings Article | 24 March 2017 Presentation + Paper
Du Hyun Beak, Ju Hee Shin, Tony Park, Dong Kyeng Han, Jin Phil Choi, Jeong Heung Kong, Young Seog Kang, Se Yeon Jang, Peter Nikolsky, Chris Strolenberg, Noh-Kyoung Park, Khalid Elbattay, Vito Tomasello, Austin Peng, Anand Guntuka, Zhao-Ze Li, Ronald Goossens, Machi Ryu, Jangho Shin, Chung-Yong Kim, Andrew Moe, Yun-A Sung
Proceedings Volume 10147, 101470A (2017) https://doi.org/10.1117/12.2258339
KEYWORDS: Critical dimension metrology, Scanners, Lithographic illumination, Image processing, Process control, Computational lithography, Semiconducting wafers, Data modeling, Metrology, Photomasks, Calibration, Finite element methods, Laser scanners, 3D scanning

SPIE Journal Paper | 1 July 2010
JM3, Vol. 9, Issue 03, 033001, (July 2010) https://doi.org/10.1117/12.10.1117/1.3459941

Proceedings Article | 2 April 2010 Paper
Proceedings Volume 7638, 76382F (2010) https://doi.org/10.1117/12.845823
KEYWORDS: Overlay metrology, Semiconducting wafers, Semiconductors, Optical lithography, Data modeling, Optical alignment, Scanners, Lithography, Metrology, Inspection

Showing 5 of 19 publications
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